Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5423445 | Surface Science | 2012 | 7 Pages |
Abstract
⺠Vanadium oxides (VO2, V2O3, V2O5, V6O13) are modeled as bulk and thin film structures using reactive molecular dynamics. ⺠Stability is estimated to be V2O5, V6O13, V2O3 and VO2 in decreasing order when formed in thin film structures. ⺠Oxidation kinetics of bulk vanadium is simulated with dry oxidation conditions. ⺠V2O3 is found to be the dominant component of oxidation kinetics.
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Authors
Byoungseon Jeon, Changhyun Ko, Adri C.T. van Duin, Shriram Ramanathan,