Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5423610 | Surface Science | 2009 | 5 Pages |
Abstract
The aim of the present study is to demonstrate the feasibility to form well-ordered nanoholes on InP(1Â 0Â 0) surfaces by low Ar+ ion sputtering process in UHV conditions from anodized aluminum oxide (AAO) templates. This process is a promising approach in creating ordered arrays of surface nanostructures with controllable size and morphology. To follow the Ar+ ion sputtering effects on the AAO/InP surfaces, X-ray photoelectron spectroscopy (XPS) was used to determine the different surface species. In4d and P2p core level spectra were recorded on different InP(1Â 0Â 0) surfaces after ions bombardment. XPS results showed the presence of metallic indium on both smooth InP(1Â 0Â 0) and AAO/InP(1Â 0Â 0) surfaces. Finally, we showed that this experiment led to the formation of metallic In dropplets about 10Â nm in diameter on nanoholes patterned InP surface while the as-received InP(1Â 0Â 0) surface generated metallic In about 60Â nm in diameter.
Related Topics
Physical Sciences and Engineering
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Physical and Theoretical Chemistry
Authors
C. Robert-Goumet, G. Monier, B. Zefack, S. Chelda, L. Bideux, B. Gruzza, O.K. Awitor,