Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5423727 | Surface Science | 2010 | 5 Pages |
Abstract
We report ab initio investigations for the adsorption mechanisms of fluorocarbon polymers at ultra low-k (ULK) surfaces. As prototypical example we study a C2F4-molecule adsorbed at a passivated SiO2:CH3(001) surface. The calculated adsorption energies between 1.37 and 1.95Â eV imply a chemisorption bonding mechanism. The detailed analysis of all investigated structures provides a simple rule to make a rough estimate of the stability of adsorbed fluorocarbon polymers. In addition, an adsorption pathway is proposed and used to suggest a possible adsorption mechanism, triggered by an electron transfer between the ULK surface and the C2F4 molecule.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
R. Leitsmann, O. Böhm, Ph. Plänitz, C. Radehaus, M. Schaller, M. Schreiber,