| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5424026 | Surface Science | 2009 | 4 Pages |
Abstract
The influence of the substrate wetting properties on the grid assisted deposition of tris-(8-hydroxyquinolinato)aluminum(III) (Alq3) onto Si/SiOx surfaces was investigated. Different degrees of hydrophilicity/hydrophobicity on the Si/SiOx were obtained by changing the surface chemical functionalities with wet treatments. We observed that the deposited Alq3 films can be spatially controlled and assembled either into continuous grid-like stripes or ordered dots depending upon the wetting properties of the substrate.
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Physical and Theoretical Chemistry
Authors
Massimiliano Massi, Massimiliano Cavallini, Fabio Biscarini,