Article ID Journal Published Year Pages File Type
5424778 Surface Science 2009 6 Pages PDF
Abstract
In this work, first-principles modeling techniques are used to investigate the mechanism(s) of adsorption of molecular oxygen on the GaAs(0 0 1)-(2 × 4) surface. The reaction of adsorption was modeled using ab-initio molecular dynamics at constant temperature for two thermal regimes, i.e. 300 K and 680 K, respectively. The resulting adsorbate configurations were relaxed using density functional theory and the adsorption energies were subsequently computed. Our results suggest a dominant mechanism of adsorption described by molecular dissociation, followed by oxygen insertion in the Ga-As bonds, bridging Ga-O-As chemical bonds. The electronic properties of the clean reconstructed GaAs(0 0 1) surface and the ones obtained after O2 adsorption were computed. It is found that for the most stable adsorbate configuration, where oxygen is incorporated in a Ga-O-As unit, the associated density of electronic states is free of defect levels within the GaAs band gap region.
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
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