Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5425119 | Surface Science | 2007 | 4 Pages |
We fabricated iron and iron silicide microstructures on an Si(1Â 0Â 0) clean surface via electron beam induced process of Fe(CO)5 multilayer and subsequent annealing. The fabricated microstructures were in situ analyzed by Auger electron spectroscopy (AES) and scanning electron microscopy (SEM). We successfully analyzed the coverage and chemical states of the artificial deposited iron structure area-selectively by AES. The artificial iron structure was fabricated after heating to above 350Â K to desorb residual Fe(CO)5 species. The artificial structure was observed even after 1190Â K annealing by SEM, but AES measurements showed it to be covered by Si atoms. We concluded that the buried iron silicide microstructure was formed by the present process.