| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5425368 | Surface Science | 2008 | 9 Pages |
Abstract
We report here on a detailed atomistic stress analysis of the near-surface stresses on the 2Â ÃÂ 1 surface reconstruction on Si(0Â 0Â 1). We find that the surface stresses are spatially periodic with fairly large amplitude. We additionally investigate the stresses in the neighborhood of an SA-type step.
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Chemistry
Physical and Theoretical Chemistry
Authors
T.J. Delph,