Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5425426 | Surface Science | 2007 | 8 Pages |
Abstract
A thin and homogeneous alumina film was prepared by deposition and oxidation of aluminum on a refractory Re(0Â 0Â 0Â 1) substrate under ultrahigh vacuum conditions. X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS) and high-resolution electron-energy-loss spectroscopy (HREELS) demonstrate that the oxide film is long-range ordered, essentially stoichiometric and free from surface hydroxyl groups. The chemisorption and thermal decomposition of Mo(CO)6 on the Al2O3 film were investigated by means of XPS and UPS. Mo(CO)6 adsorbs molecularly on the oxide film at 100Â K; however, thermal decomposition of the adsorbate occurs upon annealing at high temperatures. Consequently the metallic molybdenum clusters are deposited on the thin alumina film via complete decarbonylation of Mo(CO)6.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Zhiquan Jiang, Weixin Huang, Zhen Zhang, Hong Zhao, Dali Tan, Xinhe Bao,