Article ID Journal Published Year Pages File Type
5426048 Surface Science 2007 6 Pages PDF
Abstract

Oblique incidence reflectivity difference (OI-RD) measurements reveal differences in the earliest stages of overpotential-deposited (OPD) growth between Pb electrodeposition on polycrystalline Cu surfaces in the presence and absence of Cl−. At moderate overpotentials, when only 100 mM ClO4- is present, the magnitude of the real part of the OI-RD signal continues to increase after completion of the first underpotential-deposited (UPD) Pb monolayer, but with the addition of 20 mM KCl the magnitude decreases after the UPD monolayer forms. In situ atomic force microscopy (AFM) shows that in the former case the island density is much greater than in the latter. Using OI-RD as a probe, we show additionally that when the substrate potential is returned to a more positive potential in the presence of Cl−, the UPD Pb monolayer dissolves after the Pb islands disappear.

Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
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