| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5426354 | Surface Science | 2006 | 6 Pages |
Abstract
Layers prepared by pulsed TEA CO2 pulsed laser ablation (PLA) of SiO and SiO2 targets in helium were exposed to hydrogen and deuterium atmosphere up to several kPa. The deposited layers were investigated by FTIR, EPR and XP spectroscopy. Among various Si species silyl radical Si(·)H (Si(·)D) at 2166 (1568) cmâ1-H(I) center-and silyl hydroperoxide SiOOH (SiOOD) at 3587 (2648) cmâ1 were identified in FTIR spectra. Chemical pathways for production of these species are discussed. Experimental results are supported by quantum chemical calculations.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Vladislav DÅÃnek, Karel Vacek, Gleb Yuzhakov, ZdenÄk Bastl, Sergej Naumov,