| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5426905 | Surface Science | 2006 | 4 Pages |
Abstract
Oxidation of vanadium metal surfaces at room temperature by low-energy oxygen ion beams is investigated by X-ray photoelectron spectroscopy (XPS). It is observed that ion-beam irradiation of clean V results in formation of thin oxide layer containing vanadium in oxidation states corresponding to VO, V2O3, VO2 and V2O5 oxides. The composition of the products of ion-beam oxidation depends markedly on oxygen ion fluence. The results of angle-resolved XPS measurements are consistent with a structure of oxide film with the outermost part enriched in V2O5 and VO2 oxides and with V2O3 and VO oxides located in the inner region of the oxide layer.
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Authors
N. Alov, D. Kutsko, I. Spirovová, Z. Bastl,