Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5431548 | Carbon | 2017 | 12 Pages |
It is difficult to achieve effective doping without inducing structural damage in plasma-assisted processes. In this study, we demonstrate the effects of the plasma condition on the doping and defect formation in graphene. Direct-current ammonia plasma with parallel electrodes is used. We change the electrode configuration and adjust the plasma input power and treatment time to utilize various ion-bombardment energies and plasma doses. The up-cathode system with a powered upper electrode and ground lower anode is more suitable than the traditional down-cathode system for plasma doping. This configuration yields a low-energy ion process and thus suppresses high-energy ion-induced damages. The plasma condition of 0.45Â W of power and exposure for 10Â s is the most appropriate for doping. The doping level is estimated as 1.80Ã1012 and 2.07Ã1012cmâ2 according to Raman analysis and electrical characterization, respectively. The structural evolution of graphene and the doping components are investigated via Raman spectroscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. The results provide an effective doping condition for doping nanomaterials without plasma-induced damage.
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