Fabrication of flexible optoelectronic devices based on MoS2/graphene hybrid patterns by a soft lithographic patterning method

A cross-stacking MoS2/graphene hybrid patterns for the application to advanced flexible opto-electronic devices have been demonstrated by soft-lithographic patterning method. Well-defined MoS2/graphene hybrid pattern was fabricated simply by a soft lithographic patterning technique. In-depth exploration for the optical properties of diverse cross-stacking photodetectors based on MoS2/graphene patterns was carried out. In addition, cross-stacking MoS2/graphene was demonstrated onto a flexible polyethylene terephthalate (PET) substrate for the analysis of physical properties of devices. Substantially, this method should pave the way for realistic applications of transparent and flexible nano-electronic devices based on 2D materials.

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