Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5439884 | Corrosion Science | 2017 | 36 Pages |
Abstract
In this work, three halogeno-indazole compounds were investigated for corrosion inhibition of copper in 3.0Â wt% NaCl solution using potentiodynamic polarization measurement, electrochemical impedance spectroscopy, and X-ray diffraction (XRD) analysis. The electrochemical results revealed that all of these organics are mixed-type inhibitors with an inhibitive ability order: 4-CIA >Â 4-BIA >Â 4-FIA, which was further confirmed by observations with field emission scanning electron microscope (FE-SEM) and atomic force microscope (AFM). Their favourable performance is ascribed to the formation of inhibitor-adsorption films on copper. Furthermore, theoretical calculations showed the electronic structure of studied compounds and their optimized adsorption configurations on the copper surface.
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Authors
Yujie Qiang, Shengtao Zhang, Song Yan, Xuefeng Zou, Shijin Chen,