Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5442341 | Optical Materials | 2017 | 7 Pages |
Abstract
The effects of atmosphere heat treatment on optical, stress, and microstructure properties of an HfO2 film deposited by ion-beam sputtering were systematically researched. The relationships among annealing temperature and refractive index, extinction coefficient, physical thickness, forbidden-band width, tape trailer width, Urbach energy, crystal phase structure, and stress were assessed. The results showed that 400 °C is the transformation point, and the microstructure of the HfO2 film changed from an amorphous into mixed-phase structure. Multistage phonons appeared on the HfO2 film, and the trends of the refractive index, extinction coefficient, forbidden-band width change, and Urbach energy shifted from decrease to increase. With the elevation of the annealing temperature, the film thickness increased monotonously, the compressive stress gradually turned to tensile stress, and the transformation temperature point for the stress was between 200 °C and 300 °C. Therefore, the change in the stress is the primary cause for the shifts in thin-film thickness.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Huasong Liu, Yugang Jiang, Lishuan Wang, Shida Li, Xiao Yang, Chenghui Jiang, Dandan Liu, Yiqin Ji, Feng Zhang, Deying Chen,