Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5442589 | Optical Materials | 2017 | 6 Pages |
Abstract
In this work, we give a detailed experimental and theoretical analysis of a nano cone array on silicon wafer, which can greatly enhance the absorption compared with the polished silicon. The experimental absorptance can reach 98.7% in the wavelength ranging from 400Â nm to 1100Â nm. The mechanism of absorption enhancement is attributed to the nano cone array that can suppress the reflection by building a grade index from air to silicon surface. Moreover, an ultrathin 13Â nm thickness gold film was sputtered on the nano cone array, by which surface plasmon can be excited and the absorption in the near-infrared region can be greatly enhanced. We also give a deep comprehending on the physics mechanism of such high absorption. This kind of nano cone array can be fabricated by a simple and low-cost colloidal sphere lithography and reactive ion etching, which makes it a more appropriate candidate for photovoltaics, spectroscopy, photodetectors, sensor, especially for the silicon-based application in the near-infrared region.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Qiang Li, Jinsong Gao, Zizheng Li, Haigui Yang, Hai Liu, Xiaoyi Wang, Yudong Li,