Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5442833 | Optical Materials | 2017 | 7 Pages |
Abstract
We investigated the damage effect on the refractive index as well as the lattice expansion induced by C3+ ion implantation into KTiOPO4 crystals. A KTiOPO4 channel waveguide was formed by area-selective 6.0Â MeVÂ C3+ ion implantation at a fluence of 5Â ÃÂ 1013 ions/cm2 using photoresist masking, and planar waveguides were formed by ion implantation with 6.0Â MeVÂ C3+ ions at fluences from 8Â ÃÂ 1012 ions/cm2 to 6Â ÃÂ 1014 ions/cm2. The propagation loss of the KTiOPO4 planar waveguides at 633Â nm fabricated at fluences of 2Â ÃÂ 1013 ions/cm2 and 5Â ÃÂ 1013 ions/cm2 after annealing is as low as 0.38 and 0.54Â dB/cm, respectively. Prism coupling and refractive index profile reconstruction using the reflectivity calculation method were used to investigate the anisotropy of the refractive indices in the KTiOPO4 waveguides region before and after annealing. The lattice expansion induced by ion implantation was investigated by combining X-ray rocking curves with atomic force microscopy. Rutherford backscattering spectrometry and channeling was applied for damage analysis, and the relationship between effective refractive index and relative defect concentration was studied.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Liang-Ling Wang, Xiao-Jun Cui, Jura Rensberg, Jiao-Jian Yin, Sascha Creutzburg, Konrad Ritter, Werner Wesch, Elke Wendler,