Ridge waveguide laser in Nd:LiNbO3 by Zn-diffusion and femtosecond-laser structuring

Ridge waveguide lasers have been fabricated on Nd3+ doped LiNbO3 crystals. The fs-laser writing technique was used to define ridge structures on a gradient-index planar waveguide fabricated by Zn-diffusion. This planar waveguide was formed in a z-cut LiNbO3 substrate homogeneously doped with a 0.23% of Nd3+ ions. To obtain lateral light confinement, the surface was then micromachined using a multiplexed femtosecond laser writing beam, forming the ridge structures. By butting two mirrors at the channel waveguide end-facets, forming a waveguide laser cavity, TM-polarized laser action at 1085 nm was achieved by end-fire TM-pumping at 815 nm. The waveguide laser shows a threshold of 31 mW, with a 7% of slope efficiency.