| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5446602 | Energy Procedia | 2016 | 5 Pages |
Abstract
In view of the increasing importance of wafer surface purity for the manufacturing of high efficiency cells we present here a sensitive method for the quantitative determination of wafer surface contaminations. Our results show that the detection limits are sufficient for process control in solar cell manufacturing. Particularly, the analysis and recovery of Cu is regarded, which may - besides Fe - play an important role in the degradation of surface and interface quality of high efficiency solar cells.
Keywords
Related Topics
Physical Sciences and Engineering
Energy
Energy (General)
Authors
Sylke Meyer, Stefanie Wahl, Christian Hagendorf,