Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5446644 | Energy Procedia | 2016 | 6 Pages |
Abstract
Here we present the latest results of our double side contacted, all screen printed n-type mono silicon solar cell development. N-type Czochralski (n-Cz) silicon solar cell results are compared to those of standard p-type Cz (p-Cz) silicon and n-type epitaxial (np+ epi) wafers, produced by Crystal Solar, having an integrated epitaxial boron doped p+-silicon layer. The np+ epi and p-Cz wafers are processed applying the Hanwha Q CELLS Q.ANTUM technology process flow to make PERC cells in our production line including process adaptations to mono wafers while the n-Cz wafers are processed with an extended Q.ANTUM sequence including additional processing steps like cleaning steps and a BBr3 tube furnace diffusion to create the rear side boron p+-silicon layer. We achieve conversion efficiencies up to 21.8% for the n-type Cz silicon back junction solar cell with open circuit voltage values of 671Â mV. The p-type Cz silicon solar cell shows non-stabilized efficiencies up to 21.2%. The n-type epitaxial solar cells have efficiencies up to 21.7% with fill factor values of up to 82.1% due to the high rear side conductivity of the integrated epitaxial boron doped p+-silicon layer. The latter solar cell results demonstrate a new path to industrial solar cells with efficiencies >22% by combination of simple and robust solar cell processing and epitaxial wafer growth with built-in doping layers.
Related Topics
Physical Sciences and Engineering
Energy
Energy (General)
Authors
Stefan Bordihn, Verena Mertens, Janko Cieslak, Gregor Zimmermann, Ronny Lantzsch, Jessica Scharf, Steffen GeiÃler, Stefan Hörnlein, Markus Neuber, Steffen Laube, Alexandra Dietrich, Barbara Szramowski, Sascha Esefelder, Tabitha Ballmann,