Optimal design of plasmonic waveguide with fabrication tolerance

An optimization approach for a plasmonic waveguide is proposed taking fabrication tolerances into consideration. The genetic algorithm is used to optimize the geometry of the nano-scaled plasmonic waveguide so that it becomes insensitive to fabrication errors with high mode confinement and long propagation length. The design variable and objective functions are defined as waveguide geometry parameters and the averaged figure of merit over local neighborhood in parameter space, respectively.