| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5449716 | Optics Communications | 2017 | 9 Pages |
Abstract
Damage behavior of HfO2 and SiO2 films under subpicosecond irradiation is investigated experimentally and theoretically in this work. The typical damage phenomenon is the transition from isolated submicrometer pits to integral ablation at transitive threshold. The experimental damage thresholds for both coatings are consistent with the theoretical calculation. The rate equation considering the feedback effect of electron number density is applied to calculate the deposited energy density, which illustrates the evolution of damage morphology.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Hu Wang, Hongji Qi, Jiaoling Zhao, Bin Wang, Jianda Shao,