Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5458398 | Journal of Alloys and Compounds | 2017 | 5 Pages |
Abstract
The GaN was grown on Si(100) with Er2O3(110) buffer by metal organic chemical vapor deposition (MOCVD). The results showed the polycrystalline nature of the layers with dominant non-polar (11-20) and semi-polar (10-13) orientations. GaN was formed in a two step process regime: low temperature growth was followed by high temperature growth regime. At a low temperature GaN tends to crystalize with dominant non-polar (11-20) orientation, while high temperature leads to preferential semi-polar (10-13) orientation growth. Additionally, the effects of parameters such as growth temperature, V/III-ratio and type of carrier gases on structural, morphological and optical properties of GaN was discussed in the current work.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Tomas Grinys, Tomas Drunga, Kazimieras Badokas, Rytis Dargis, Andrew Clark, Tadas Malinauskas,