| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5458579 | Journal of Alloys and Compounds | 2017 | 29 Pages |
Abstract
Si (100) and glass substrates deposition with N2 and H2 gas molecules as precursors in PECVD chamber to form SiCN:H thin film.403
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Mohd Azam Abdul Rahman, Wee Siong Chiu, Choon Yian Haw, Ragib Badaruddin, Fatemeh Shariatmadar Tehrani, Mohamad Rusop, Poisim Khiew, Saadah Abdul Rahman,