Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5458661 | Journal of Alloys and Compounds | 2017 | 5 Pages |
Abstract
SiGe thin films with different Ge fraction were obtained by Molecular Beam Epitaxy (MBE) on silicon (001) substrates. The SiGe thin films properties are obtained using Spectroscopic Ellipsometry (SE) in the frame of the New Amorphous model. This model demonstrates that depending on the Ge fraction high absorption coefficients of order 106 cmâ1 were obtained. The solar cell performance of SiGe/Si heterostructures was measured using a JASCO YQ-250BX system with light source of AM 1.5 solar simulator. The experimental results obtained (y = 0.15, Wa-Si: H = 2 nm) yielded to an improvement of about 1.3 mA cmâ2 for the short-circuit current density, and about 2.2% for the cell efficiency compared to the conventional cell i.e. without a-Si:H thin layer (FSF).
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
Emna Kadri, Olfa Messaoudi, Monem Krichen, Khaled Dhahri, Mohammed Rasheed, Essebti Dhahri, Abdelaziz Zouari, Kamel Khirouni, Régis Barillé,