The microstructure and magnetic properties of Co2MnSi thin films deposited on Si substrate

Co2MnSi (CMS) thin films with different thickness were deposited on Si substrate and annealed at different temperatures to investigate the evolution of microstructure and magnetic properties. When Ta was fixed at 500 °C, due to the enhancement of B2-ordering, the increasing of CMS thickness to 100 nm will induce the increasing of Ms to 862 emu/cc. When CMS film thickness was fixed at 75 nm, the abnormal decrease of the Ms value from 782 emu/cc to 614 emu/cc were observed with increasing Ta to 700 °C which may be attributed to the intermixing between CMS layer and Ta layer.