Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5459547 | Journal of Alloys and Compounds | 2017 | 11 Pages |
Abstract
Mg-Ti-H films with a Ti content in the range 0 â¤Â at.% Ti < 20 were obtained in a single-step process using the microwave reactive plasma-assisted co-sputtering technique. The morphology, crystal structure, chemical composition and spatial distribution of the elements were investigated by X-ray diffraction, scanning and transmission electron microscopy coupled with energy-dispersive X-ray spectroscopy and precession electron diffraction. Our results show that the Ti-poor films (0 â¤Â at.% Ti â¤Â 0.45) exhibit mainly the tetragonal β-MgH2 phase and have a dense microstructure with discontinuous columnar grains. For the films with a medium Ti content (2.7 â¤Â at.% Ti â¤Â 6.6), the β-MgH2, metastable orthorhombic γ-MgH2 and Mg-Ti phases were found in different proportions, with a typical columnar growth. The abrupt microstructural changes of the films with a Ti content >10 at.% correlate with the change in crystallinity. These films exhibit a mainly amorphous/nanocrystalline structure with a granular morphology. We showed that the Ti content plays a significant role in the formation of structural and microstructural features of the Mg-Ti-H films, which might be a useful parameter in tuning the functional properties of magnesium hydride.
Related Topics
Physical Sciences and Engineering
Materials Science
Metals and Alloys
Authors
I. Iliescu, N. Skryabina, D. Fruchart, A. Bes, A. Lacoste,