Article ID Journal Published Year Pages File Type
5459839 Journal of Alloys and Compounds 2017 11 Pages PDF
Abstract
The influence of the ZnO buffer layer thickness on the structural, electrical, optical and surface properties of Ga-doped ZnO (GZO) films deposited on glass substrates by RF magnetron sputtering were investigated. X-ray diffraction results showed the obtained films had highly c-axis oriented with hexagonal (002) structures and GZO film with 20 nm buffer layer had the best crystalline quality. The resistivity in GZO/ZnO bi-layer films decreased significantly than that in GZO film without a ZnO buffer layer, and GZO film with 20 nm buffer layer showed the lowest resistivity of 4.09 × 10−4 Ω cm. The bi-layer films exhibited the highest transmittance of over 80% in the visible light range and displayed a low near infrared transmittance. The correlation between surface morphology and wettability was studied and GZO/ZnO bi-layer films exhibited hydrophobic property with contact angle of θ from 104° to 108.5°, indicating acceptable property of environmental durability.
Related Topics
Physical Sciences and Engineering Materials Science Metals and Alloys
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