Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5463318 | Materials Letters | 2017 | 4 Pages |
Abstract
BaSn0.15Ti0.85O3 (BTS) thin films were deposited on a tin-doped indium oxide (ITO)/glass substrate by RF sputtering from a powder target using BTS powders of different particle sizes, the structural and electrical properties of the BTS thin film investigated. The results indicate that deposition rate and electrical properties of the BTS film are strongly related to the particle size of BTS powder, with the deposition rate increasing with a decrease in the powder particle size. When the particle size of the BTS powder is 70Â nm, a deposition rate of 40Â nm/min was achieved. The leakage current density decreases with increasing the deposition rate when depositing the BTS thin film. Further, the leakage current density of the BTS thin film by the nano-powder is one order of magnitude higher than that of the micron powder, while the leakage current density is lower than 7.83Â ÃÂ 10â9Â A/cm2, the dielectric tunability reaches 57.8% and dielectric loss remains only 0.017 at bias voltage of 5Â V.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Zhu GS, Xu HR, Li JJ, Wang P, Zhang XY, Chen YD, Yan DL, Yu AB,