Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5464395 | Surface and Coatings Technology | 2017 | 26 Pages |
Abstract
Caused by unique properties of organic-inorganic hybrid perovskite films, the patterning process is very challenging. In this study, novel method for etching of perovskite film is suggested using atmospherically hydrogen-containing plasma treatment. It is illustrated successful eating of methylammonium triiodideplumbate (CH3NH3PbI3) perovskite films on glass substrates. Perovskite layers are processed for various times between 2Â s and 300Â s. Based on the transformation of film's morphology upon treatment time three regions are distinguished; i.e. short (less than 10s), medium (up to 180Â s) and long (>Â 180Â s). Although onset of the early modifications is observed after 10Â s treatment the bulk characteristics of the film remain mainly the same. After 30Â s treatment nano-sized particles are observed in the entire film. When plasma treatment performed longer period i.e. 180 and 300Â s, some particles are agglomerated forming relatively large clusters. The morphological and chemical properties of the plasma-processed films are analyzed using various analytical tools such as scanning electron microscope (SEM), transmission electron microscope (TEM), energy dispersive X-ray spectroscopy coupled with SEM or TEM (EDS-SEM and EDS-TEM), and x-ray photoelectron spectroscopy (XPS).
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Hyeong-Pil Kim, Moojin Kim, Kyoung-Bo Kim, Hayk Khachatryan, Jin Jang,