Article ID Journal Published Year Pages File Type
5464645 Surface and Coatings Technology 2017 27 Pages PDF
Abstract
Titanium morphology does not change with power or pressure. The deposition rate is lower than predicted by the differences in sputtering yields at 68 nm h− 1 for a pressure of 6 Pa.
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Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
Preview
Study of the effect of RF-power and process pressure on the morphology of copper and titanium sputtered by ICIS
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