Plasma-assisted reactive high-rate vapor deposition of yttria-stabilized zirconia using electron beam evaporation and spotless vacuum arc

Pores were evidenced in the microstructure of the layers deposited at a coating rate of > 50 nm s− 1. Nevertheless, very dense YSZ layers could be obtained at a coating rate of 30 nm s− 1 and a spotless arc current of 300 A. Specific leakage rates of YSZ layers on porous Ni/NiO-YSZ anode substrates measured using air are in the region of 1 Pa m s− 1. The investigations have shown that the intense plasma created with a spotless arc has a considerable influence on growth and microstructure of YSZ layers, even at high coating rates.