Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5464934 | Surface and Coatings Technology | 2017 | 22 Pages |
Abstract
In this study, we present a simple method for producing SiO2 antireflection (AR) coatings functionalized photoanodes by liquid phase deposition (LPD) using a deposition solution of hydrofluosilicic acid (H2SiF6) and boric acid (H3BO3). Antireflection coatings are used in dye-sensitized solar cells (DSSCs) to grad the reflective index between the glass and air interface. The less refractive index of the LPD-SiO2 coating also helps to improve the transmittance of the AR coating. This paper presents a detailed study obtained of DSSCs, with and without this LPD-SiO2 AR coating. Measurements show a short current density gain of 25.39%. The DSSC efficiency was improved from 4.76 to 6.03% with the LPD-SiO2 AR coating.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Chao-Nan Chen, Menq-Jion Wu, Chun-Fa Hsu, Jung-Jie Huang,