Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5464958 | Surface and Coatings Technology | 2017 | 7 Pages |
Abstract
In order to study the effects of anode layer linear ion source(ALLIS)on the microstructure and mechanical properties of amorphous carbon nitride (a-CNx) films, a-CNx films were deposited by the ALLIS assisted radio frequency magnetron sputtering (RFMS) deposition condition changing the ion source power from 0 to 200Â W. The growth rate, structural morphology, surface roughness, nanohardness as well as the bonding states of deposited a-CNx films were characterized by scanning electron microscope (SEM), atomic force microscope (AFM), nanoindentation, Raman spectroscopy and X-ray photoelectron spectroscopy (XPS), respectively. The H/E and hardness increased relatively with increasing the ion source power up to 100Â W. From the Micro Raman analysis, the content of sp3 carbon in sp3/sp2 ratio was increased with increasing the ion source power. The cross-sectional SEM images demonstrated that the ion source enhanced the growth rate of a-CNx films. Meanwhile, the roughness was increased with the ion source power above 100Â W. Therefore, the optimum ion source power is considered to be around 100Â W in these experimental conditions.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Peng Ye, Feng Xu, Jinxin Wu, Shuai Tian, Xianrui Zhao, Xiaolong Tang, Dunwen Zuo,