Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5465349 | Surface and Coatings Technology | 2016 | 26 Pages |
Abstract
This article reports on flexible hard Al-Si-N films prepared by reactive magnetron sputtering. The structure and mechanical properties of Al-Si-N films were controlled by the content of Si in the film, partial pressure of nitrogen pN2 used in sputtering and the power delivered to the magnetron. The Al-Si-N films with a low (â¤Â 10 at.%) Si content and with a high (â¥Â 20 at.%) Si content were prepared. Correlations between the structure, microstructure, mechanical properties and their thermal stability of the Al-Si-N films are analyzed in detail. Thermal stability of Al-Si-N films was assessed by thermal annealing in air and water vapor up to annealing temperature Ta = 1200 °C. It is shown that (1) the increase of Si content in the Al-Si-N film leads to the change of its crystalline structure from polycrystalline to X-ray amorphous and (2) the flexible hard Al-Si-N films with high (i) hardness H â 20 GPa, (ii) ratio H/Eâ â¥Â 0.1, and (iii) elastic recovery We â¥Â 60% exhibit enhanced resistance to cracking and (3) the thermal stability of Al-Si-N films with a high (â¥Â 20 at.%) Si content achieves up to Ta â 1200 °C in air and up to Ta â 800 °C in water vapor; here the effective Young's modulus Eâ = E / (1 â ν2), E is the Young's modulus and ν is the Poisson's ratio. Conditions under which the flexible hard Al-Si-N films with enhanced resistance to cracking and high thermal stability can be prepared are described in detail.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
J. Musil, G. Remnev, V. Legostaev, V. Uglov, A. Lebedynskiy, A. Lauk, J. Procházka, S. Haviar, E. Smolyanskiy,