Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5465927 | Thin Solid Films | 2017 | 4 Pages |
Abstract
In this work we have studied devices (exceeding 14% efficiency) prepared by low-substrate temperature CdTe deposition and activated with MgCl2 treatment (applied by wet deposition). The devices were characterized by means of current-voltage, capacitance-voltage, drive level capacitance profiling and admittance spectroscopy techniques. Carrier concentration and also concentration and distribution of shallow and deep defects are presented and compared with data obtained from analogous devices but activated with the standard CdCl2. Despite CdTe layers treated with the two different processes exhibit similar structural properties, the distribution of deep and shallow defects results to be different and moreover admittance spectroscopy technique reveals the presence of different defects, at 344 and 358Â meV, which are present only in MgCl2 treatment case.
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Daniele Menossi, Elisa Artegiani, Andrei Salavei, Simone Di Mare, Alessandro Romeo,