Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5466104 | Thin Solid Films | 2017 | 5 Pages |
Abstract
In this study, 300Â nm thick nanoporous (np) noble metal thin films containing mesopores (2-50Â nm) or macropores (>Â 50Â nm) were fabricated by O2 plasma dealloying of sputter-deposited noble metal-carbon thin films. Noble metal-carbon thin films of 500Â nm thickness were deposited on Si wafer substrates, and the target power was controlled to obtain a proper compositional ratio. Subsequently, O2 plasma dealloying was performed to selectively remove carbon atoms, thereby forming the np structure. Using this method, we successfully fabricated various np thin films of noble metals, such as Au, Ag and Pt.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Geun-Hyuk Lee, Sehoon An, Seong Woo Jang, Sehoon Hwang, Sang Ho Lim, Seunghee Han,