| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5466360 | Thin Solid Films | 2017 | 4 Pages |
Abstract
â¢Microwave atmospheric plasma jet was used to deposit ZnO/Zn and ZnO films.â¢Both films can effectively photodegrade Rhodamine 6G dye solution.â¢ZnO/Zn film has faster degradation rate.
ZnO/Zn film was deposited on soda-lime glass substrate using a microwave atmospheric plasma jet. Energy dispersive spectroscopy showed that the Zn and O2 has an atomic ratio of 72:28. Zn (101) peak was also observed through X-ray Diffraction analysis. Annealing of the ZnO/Zn film at 400 °C for 1 h leads to the oxidation of Zn forming ZnO film. The photo-catalytic properties of the ZnO/Zn and ZnO films for the degradation of Rhodamine 6G dye were then compared. ZnO/Zn film has higher degradation rate of 1.37%/min while ZnO film has 1.23%/min.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Erin Joy C. Tinacba, Julius Andrew Nuñez, Roy B. Tumlos, Henry J. Ramos,