Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5467164 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2017 | 6 Pages |
Abstract
The nano-aperture ion source (NAIS) is a candidate to be part of a compact proton beam writing system, which has the potential of high throughput with sub 10Â nm spot sizes. To evaluate the performance of this ion source, different NAIS chip configurations were examined through simulation. This study suggests that a proton reduced brightness of more than 106Â A/(m2srV) can be achieved, with an ion energy spread of less than 1Â eV. Meanwhile, a prototype NAIS has been fabricated and tested to deliver 800Â A/(m2srV) of reduced brightness for Ar+ beam. Current limitations and further improvements of this prototype NAIS are discussed.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Xinxin Xu, P. Santhana Raman, Rudy Pang, Nannan Liu, Anjam Khursheed, Jeroen A. van Kan,