| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5467200 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2017 | 5 Pages |
Abstract
The behaviour of poly-(methyl methacrylate) (PMMA) resist exposed with 2Â MeV 1H+ and 6Â MeV 12C3+ ions has been investigated by using the photo-electron spectroscopy (PES) and X-ray absorption spectroscopy (XAS) techniques. Preliminary PES results were difficult to analyse without special precautions to counteract surface charging. XAS was on the other hand almost insensitive to the effects of surface charging. XAS investigations of the bonding in the near surface and deeper in PMMA revealed significant changes of the bonding of carbon atoms at fluences correspond to clearing (positive resist mode) and cross-linking (negative resist mode). In the clearing fluence regime the CC bonds increase in the surface and at greater depths which is consistent with our earlier work with Raman spectroscopy. In the high fluence regime where cross-linking takes place, a reduction of C-O and CO bonding is seen which might be indicative that the cross linking is associated with side-chain scission.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Rattanaporn Norarat, Karuna Jainontee, Wanlapaporn Thianthaisong, Sukonlaphat Sriwang, Hideki Nakajima, Orapin Chienthavorn, Edouard Guibert, Harry J. Whitlow,