Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5468194 | Vacuum | 2017 | 11 Pages |
Abstract
Synthesis of cuprous oxide (Cu2O) by direct current (DC) reactive magnetron sputtering technique has been demonstrated. Ar:O2 gas ratios in the plasma and the substrate temperature were the decisive parameters for the formation of unblemished Cu2O polycrystalline films. The optimal deposition parameters are: Ar:O2 â¼90:10; Tsâ¼623Â K and d.c. power â¼0.6Â kVÂ at 1.2Â mA/cm2. Optical spectroscopy, photo luminescence, X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and Raman measurements were carried out to characterize the films. Predominant p-type conductivity in the Cu2O films was confirmed from Hall measurement.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
S. Dolai, S. Das, S. Hussain, R. Bhar, A.K. Pal,