Influence of the aluminum content on structure and optical properties of Zr1-xAlxN films

The Zr1-xAlxN films have been deposited on Si (111) and glass (soda lime glass) substrates by ion beam assisted deposition. The microstructure, morphology, electrical resistivity and optical properties of the Zr1-xAlxN films were investigated by XRD, TEM, four-probe method and spectroscopic ellipsometry. In the Al composition range 0.32 ≤ x ≤ 0.7, the Zr1-xAlxN films contain crystallized ZrAlN (NaCl type). The deposited Zr0.2Al0.8N film is amorphous. The aluminum content increase in the Zr1-xAlxN films induces the film structure tends to amorphization. The refractive index of the Zr1-xAlxN films increases with Al content increase, whereas, a continuous decrease of the extinction coefficient was noticed. As the Al content increase, the electrical resistivity of films increases. The addition of Al into ZrN-based films leads to the loss of the metallic character.