Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5468267 | Vacuum | 2017 | 21 Pages |
Abstract
Ti-W-Al-N films with various Al content (0 at.% â¼Â 12.4 at.%) were deposited by reactive magnetron sputtering. The composition, microstructure, mechanical and tribological properties of Ti-W-Al-N films were investigated by EDS, XRD, HRTEM, SEM, Nano-indentation, Ball-on-disk tribometer. It is found that Ti-W-Al-N films consist of Ti-W-Al-N phase, Ti2N phase and W2N phase below 2.9 at.% Al. Ti2N phase disappears at 5.6 at.% Al and h-AlN phase forms at 12.4 at.% Al respectively. The hardness firstly increases and then decreases with increasing Al content and the highest hardness is 35.7 GPa at 8.7 at.% Al. At room temperature, the friction coefficient continuously increases, whereas the wear rate firstly decreases and then increases with increasing Al content. The lowest wear rate of 1.79 Ã 10â8 mm3Nâ1mmâ1 is obtained at 8.7 at.% Al. As the temperature increases from room temperature to 700 °C, the friction coefficient firstly increases and then decreases, while the wear rate gradually increases. The tribological properties of the film depended on the testing temperatures significantly because the testing temperatures influenced the hardness, the tribo-films and wear mechanism of the film.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Lihua Yu, Jian Chen, Hongbo Ju, Hongzhi Dong, Hongjian Zhao,