Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5468411 | Vacuum | 2017 | 6 Pages |
Abstract
Carbon-iron composite films with different thicknesses (50, 100 and 150Â nm) were deposited by DC magnetron sputtering method using a composite target (Fe: 4Â at%, C: 96Â at%). The resistive switching behaviors of Pt/Al/a-C:Fe/Au/Ti structures with different a-C:Fe film thicknesses are investigated. Abnormal bipolar resistive switching characteristics were observed in all Pt/Al/a-C:Fe/Au/Ti memory cells. Considering the endurance and retention properties, the RRAM cell with 100Â nm thick a-C:Fe film as the dielectric layer showed the best performance with on/off-resistance ratio â¼10, and retention time >104Â s. Based on the results of the X-ray photoelectron spectroscopy depth profile, the resistive switching behavior is attributed to mutative Al3+ fraction at the Al/a-C:Fe interface and the migration of Au ions between two electrodes.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
J.W. Zhou, T.R. Li, D. Zhang, B. Ren, S.W. Zhang, J. Huang, J.M. Zhang, L. Wang, Y.C. Jiang, J. Gao, L.J. Wang,