Article ID Journal Published Year Pages File Type
5489173 Journal of Crystal Growth 2017 4 Pages PDF
Abstract
We compare the interface roughness scattering of electrons at the In0.53Ga0.47As/In0.52Al0.48As heterointerface simultaneously grown on (100) and (411)A oriented InP substrates using gas-source molecular-beam epitaxy (MBE). A modulation-doped double quantum well structure is designed to emphasize the effects of interface scattering. The transport properties for both (100) and (411)A orientations are compared for different MBE growth temperatures. The highest mobilities on (411) oriented structures are 40% higher than those on (100) oriented structures, indicating less electron scattering due to interface roughness scattering.
Related Topics
Physical Sciences and Engineering Physics and Astronomy Condensed Matter Physics
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