Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5489724 | Journal of Crystal Growth | 2017 | 6 Pages |
Abstract
Cr2O3 thin films with a thickness of ~180 nm are grown on c-plane α-Al2O3 (0001) single crystal substrates at a substrate temperature of 320 °C by non-reactive radio frequency magnetron sputtering. Phase formation and composition are characterized by X-ray diffraction (XRD) and Raman spectroscopy analysis. Additional information such as in-plane and out-of-plane lattice parameters, strain relaxation and texture are obtained by reciprocal space mappings (RSMs) and pole figure measurements. Transmission electron microscopy (TEM) has been carried out in order to study the microstructure and further confirm the orientation and epitaxial relationship between films and substrates.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Condensed Matter Physics
Authors
Yin Gao, Harald Leiste, Michael Stueber, Sven Ulrich,