| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5498014 | Applied Radiation and Isotopes | 2017 | 5 Pages |
Abstract
In the paper a manufacturing process of three-dimensional (3D) microchannel structure by silicon (Si) anodic etching was discussed. The possibility of microchannels formation allows to increase the active area more than 100 times. In this structure the p-n junction on the whole Si surface was formed. The obtained data allowed to evaluate the characteristics of the betavoltaic converter with a 3D structure by using isotope 63Ni with a specific activity of 10Â Ci/g.
Keywords
Related Topics
Physical Sciences and Engineering
Physics and Astronomy
Radiation
Authors
A.A. Krasnov, V.V. Starkov, S.A. Legotin, O.I. Rabinovich, S.I. Didenko, V.N. Murashev, V.V. Cheverikin, E.B. Yakimov, N.A. Fedulova, B.I. Rogozev, A.S. Laryushkin,