Preparation of γ-Bi2MoO6 thin films by thermal evaporation deposition and characterization for photocatalytic applications

Thin films of γ-Bi2MoO6 were formed from γ-Bi2MoO6 powders by a decomposition/evaporation sequential process in a Thermal Evaporation System (TES). In order to get a controlled decomposition/evaporation of the material the deposition rate was fixed at 1.2 Å s−1. The deposited films were analyzed by XRD, TEM, SEM, and EDS. These analyses revealed the formation of Bi and Mo nanoparticles of around 10 nm in their metallic form, respectively. The EDS analysis of the deposited film showed that the atomic Bi–Mo ratio (2:1) was maintained. The thin film was treated at 550 °C under atmospheric oxygen to promote the formation of γ-Bi2MoO6 oxide. The XRD confirmed the formation of the γ-Bi2MoO6 oxide in a thin film of 200 nm of thickness. Thin films of γ-Bi2MoO6 showed photocatalytic activity for the bleaching of rhodamine B under visible-light irradiation.