| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 579085 | Journal of Hazardous Materials | 2011 | 12 Pages |
Abstract
⺠UV and UV/H2O2 photolysis of fenofibric acid. ⺠Identification of reaction intermediates using exact mass measurements. ⺠UV/H2O2 removed toxicity towards Pseudokirchneriella subcapitata. ⺠Irradiated samples contain a number of chlorinated products.
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Authors
Javier Santiago, Ana Agüera, MarÃa del Mar Gómez-Ramos, Amadeo R. Fernández Alba, Eloy GarcÃa-Calvo, Roberto Rosal,