Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
581730 | Journal of Hazardous Materials | 2009 | 4 Pages |
Abstract
This work reports medium- and short-range order of changes of amorphous silica submitted to chemical degradation. Structural changes were studied, using X-ray absorption near edge structure (XANES), nuclear magnetic resonance 29Si NMR-MAS and controlled pressure scanning electron microscope (CP-SEM). The depolymerisation of amorphous SiO2 compounds mainly induces the formation of Q3 species and alkali-rich domains. The XANES Si K-edge spectra demonstrate the presence of different environments of silicon: one with four oxygen atoms and the other with a number of oxygen lower than four in agreement with previous studies.
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Authors
L. Khouchaf, A. Hamoudi, P. Cordier,